Lam Research
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Lam Research Process Engineer III Interview Question (student candidate)

I interviewed in Fremont, CA and was asked:
"How would you solve an undercut issue when etching silicon with top hard mask?"
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Part of a Process Engineer III Interview Review - one of 52 Lam Research Interview Reviews

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Use passivation gas at the initial stage of etch
- Interview Candidate on Oct 15, 2012 Flag Response

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