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Device Engineer Interview Questions

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Which one is a more viable option for 45nm technology : NiSi2 vs CoSi2:

2 Answers

Below 50nm it is difficult to form CoSi2 on poly lines. NiSi2 had advantages such as less Si consumption with Ni than with Co. Also in case of NiSi2 cap layer is optional so that meant reduction in number of process steps. A single RTP step is sufficient for NiSi2.

completely wrong answer... should be piping concern..

What is gate induced barrier lowering effect?

2 Answers

They showed a board from one of their devices and asked to identify the various components on it.

1 Answer

what is volatile, static ? how would it affect if the static keyword used for big array inside a function? what are sections of memory and what kind of variable is stored where?

3 Answers

Write a bind method that implements function currying

1 Answer

Write a contains function in javascript

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what are virtual links in OSPF

1 Answer

what is the address in the IP field when it goes from one router to another

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What equation describe the filed-charge characteristic in the N+ AlGaAs layer of the HEMT device.

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A question related to a technique I presented as part of my research, but of which was enough removed that I could dig myself a hole if I was not careful.

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